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FILTERS DIFFUSERS
CONTENTS
GasFilters 06
Diffusers 14
What's filtration 16
Filters & Diffusers
ASFLOW Filters and Diffusers are designed to meet the stringent standards required in the industry
Index
High Performance Stainless Steel Gas Filter
Specification
| Retention | ≥LRV9ofParticledownto0.0025m | |
| RatedFlow | 50SLPM/150SLPM/300SLPM/600SLPM/1300SLPM | |
| Materials | Filterelement | 316LStainlessSteel |
| Electropolishedhousing | ||
| ElementOperating Conditions | Max.inletpressure | 21 MPa (210kfg/cm²) at20°C |
| Max.differentialpressure | 15MPa(153kfg/cm²)at20°C | |
| Max.operatingtemperature | 460°℃(Inert gas) | |
| HeliumLeakRating | 1x10-10atm·cc/sec | |
| SurfaceFinishInterior | ≤ Ra 5 μinch | |
Performance Data
Ordering Information
Dimension
High Performance Hastelloy Gas Filter
Specification
| Retention | ≥LRV9ofParticledown to0.0025m | |
| RatedFlow | 50SLPM/150SLPM/300SLPM | |
| Materials | Filterelement | Hastelloy C-22 |
| Electropolishedhousing | 316LStainlessSteel,HastelloyC-22 | |
| ElementOperating Conditions | Max.inletpressure | 21 MPa (210 kfg/cm²) at 20 °C |
| Max.differentialpressure | 15MPa(153kfg/cm²)at20°C | |
| Max.operatingtemperature | 460°C(Inert gas) | |
| HeliumLeakRating | 1×10-10atm·cc/sec | |
| SurfaceFinishInterior | ≤ Ra 5μinch | |
Performance Data
![[HHF300]](https://book.yunzhan365.com/gtuvl/ewoc/markdown/images/763e730c7c558fbe9bc120a55ef94f7fc351cb350c5815827e4abf0abd77edc6.webp)
Ordering Information
Dimension
Gasket Filter
Specification
| Retention | 99.99%ofParticledownto0.3pm |
| RatedFlow | 20 SLPM |
| Materials | 316LStainlessSteel |
| FaceSeal GasketType | VCR |
| FaceSealGasketSize | 1/4" |
| ElementLength(Nominal) | 1" |
| Max.DifferentialPressure | 1000 psid (20°C) |
| Max.OperatingTemperature | 460°℃(Inertgas) |
Performance Data
Ordering Information
Dimension
Bulk Gas Filter
Specification
| Retention | ≥ 0.0025μm | |
| Max.RatedFlow | 20,000SLPM | |
| Materials | Housing | 316LStainlesssteel |
| Media | ||
| OperatingTemperature | 460°Cat100psi | |
| HeLeakRating | 1x10-10atm·cc/sec | |
| SurfaceFinishInterior | ||
Performance Data
Ordering Information
| FLT | 180L | 04 | ||||
| LOK | ||||||
| Product | Length | Connection Size | Connection Type | |||
| FLT | Filter | 180L | 04 1/4" | LOK | ||
| 270L | 06 | 3/8" NW25 | ||||
| 300L | 08 1/2" | NW40 | ||||
| 12 3/4" | NW50 | |||||
Dimension
| Model Ordering No. | Media A (Length) | B | C(Connection) | D(O.D) | ||||||
| Size Φ30 | (mm) | (mm) | (ww) | TYPE | (mm) | |||||
| FLT-180L-08LOK FLT-180L-12LOK | 180 180 | 10.4 15.7 | 1/2 | LOK | 60.5 | |||||
| FLT-180L-NW25 | 26.2 | 3/4" NW25 | LOK | 60.5 | ||||||
| 100 L x 1 FLT-18OL-NW40 | 180 | 60.5 | ||||||||
| B | 180 | 41.2 | NW40 | 60.5 | ||||||
| D C A | FLT-180L-NW50 | 180 | 52.2 | NW50 | 75 | |||||
| FLT-27OL-NW25 Φ30 | 270 | 26.2 | NW25 | |||||||
| 120 L x 3 FLT-300L-NW50 | 300 | 52.2 | NW50 | 89.1 89.1 | ||||||
Diffusers
Specification
| Retention | Greaterthan99.99%removalofallparticlesdownto0.0025pm |
| RatedFlow | 0～10,000 SLPM |
| Materials | 316LStainlessSteel |
| MaxOperatingTemperature forInertGas | 460°CwithoutO-ring |
| 100°CwithO-ring | |
| ParticleShedding | Zeroparticlecontributionabovebackground ( |
Performance Data
![[AF-DFS437]](https://book.yunzhan365.com/gtuvl/ewoc/markdown/images/fbf292d48154af8027d4f7d44fbf0ca6f9f3c0ff7569a01e210d4d631d0c70a4.webp)
Ordering Information
Dimension
| DFS-04MV-OOO | DFS-04MVOONW-OOO | |||||||
| D | ||||||||
| B D | B | |||||||
| Ordering No. | MembraneSize | Total Size | ||||||
| A(Φ) | B(mm) | C(Φ) D(mm) | Remarks | |||||
| DFS-04MV-001 DFS-04MV-002 | 20 | 38 | 23.5 | 64.5 | ||||
| 20 | 53 | 23.5 | 79.5 | |||||
| DFS-04MV-003 | 20 | 120 | 23.5 | 146.5 | ||||
| DFS-04MV16NW-001 | 15 | 55 | 30 | 102.2 ISO Clamp | ||||
| DFS-04MV16NW-002 | 15 | 85 | 30 | 132.2 ISO Clamp | ||||
| DFS-04MV25NW-001 | 20 | 57 | 40 104 | ISO Clamp | ||||
| DFS-04MV25NW-002 | 15 | 57.5 | 40 104 | ISO Clamp | ||||
| DFS-04MV25NW-003 ASELOWDiff | 15 | 37 40 | 83.5 | ISO Clamp | ||||
[DFS-12-Series]
| OrderingNo. | MembraneSize | TotalSize | Remarks | ||
| A（Φ) | B(mm) | C(Φ) | D(mm) | ||
| DFS-12MV-001 | 30 | 120 | 33.3 | 166 | |
| DFS-12MV-002 | 20 | 120 | 33.3 | 166 | |
[DFS-25-Series]
| OrderingNo. | MembraneSize | TotalSize | Remarks | ||
| A(Φ) | B(mm) | C(Φ) | D(mm) | ||
| DFS-25NW4ONW-001 | 30 | 120 | 55 | 165 | |
| DFS-25NW4ONW-002 | 30 | 120 | 55 | 255 | |
| *ASFLOwDiffuserscanbetailored tocustomers'needswithavarietyofend connections.Pleasecontactus. | |||||
[DFSM-Series/DFS-Series】
| DFSM-Series | DFS-Series | ||||||||
| B | |||||||||
| MembraneSize | Total Size | ||||||||
| Ordering No. | A (Φ) | B (mm) | C(Φ) | D (mm) | Remarks 1pic,withholecover | ||||
| DFSM- Series | DFSM-28-001 | 30 | 120 | 46 | 170 | ||||
| DFSM-28-002 | 120 | 46 | 161.8 | 1 pic | |||||
| DFSM-28-003 | 30 30 | 120 | 46 | 161.8 | 1pic,withoutO-ring | ||||
| DFSM-30-003 | 30 | 120 | 53.1 | 168.8 | |||||
| DFS 307P | 53 | 307 | 2pic,withholecover | ||||||
| DFS- Series | 30 30 | 120 120 | 46 | 430 | 3pic | ||||
| DFS 430P DFS 437P | 30 | 120 | 53 | 437 | 3pic,withholecover | ||||
| *ASFLOw Diffusers canbe tailored to customers'needswith a variety of end connections.Please contact us. | |||||||||
Fundamentals of Gas Filtration
Diffusion: particle deposition via diffusion results when particles collide withthefilterstructuredue to theirrandomBrownianmotion.
Interception: A particle is deposited via the interception mechanism if a particle of finite size is brought within one particle radius of the filter structure as it follows the flow streamlines around the filter structure.
Inertial impaction : This mechanism becomes an increasingly significant means of particle collection for larger particles (particle mass), and highergasvelocities.
Electrostatic effects:Particles deposit viaelectrostatic deposition if electrical charges on either the particle or thefilter, or both, create attractiveelectrostaticforcesofsufficientmagnitudetoattract the particletothefiltersurface.
Sieving : Particles unable to pass through openings in the filter structure, due to their larger size, are captured via the mechanism of sieving
Particles held by electrostatic interactions (Van der Waal's forces)
Our mission is to optimize our manufacturing processes and offer the highest qualit products at very competitive prices. Our dedicated staffs, with the assistance of EP technology leadership, are committed to making our company the most efficient producer of super clean product.
What's Filtration?
Filtration is a mechanical / physical operation which is used for the separation of particles from fluid. It willdepend on the pore size and the thickness of the medium as well as the mechanisms that occur during filtration. Filtration is used for the purification of fluids : for instance separating dust from the atmosphere to clean air.
| Gas | GasSymbols | GasType | ProcessStep | SuggestFilterMedia | |
| Ammonia | NH3 | CVD | SS | Ni | |
| Argon | Ar | Inert | Etch,CVD,PVD | SS | Ni |
| Arsine | AsH3 | CoNosive | CVD | sS | Ni |
| BoronTrichloride | BCI3 | Corrosive | Etch | Ni | H |
| BoronTrifluoride | BF3 | Implant | Ni | H | |
| CarbonDioxide | CO2 | Various | SS | Ni | |
| Chlorine | CI2 | Corrosive | Etch | SS | Ni |
| ChlorineTrifluoride | CIF3 | Corrosive | Etch | SS | Ni |
| Diborane | B2H6 | Reactive | CVD | SS | Ni |
| Dichlorosilane | SiH2CI2 | Reactive | CVD | Ni | H |
| Hexafluoroethane | C2F6 | CoNesive | Etch | SS | Ni |
| Helium | He | Inert | Various | SS | Ni |
| Hydrogen | H2 | CoNeaive | Various | SS | Ni |
| Hydrogen Bromide | HBr | Corrosive | Etch | Ni | H |
| Hyloinipben | HCI | Corrosive | Etch,CVD | Ni | H |
| HydrogenFluoride | HF | Corrosive | Etch | Ni | H |
| Hydrogen Selenide | H2Se | CVD | SS | Ni | |
| Kryporin | Kr | Various | sS | !N | |
| Neon | Ne | Various | SS | Ni | |
| Nitrogen | N2 | Inert | CVD | sS | Ni |
| NitrogenTrifluoride | NF3 | Oxidizer | CVD | SS | H |
| NitrousOxide | N20 | CoNesive | CVD | SS | Ni |
| Oxygen | 02 | CoNesive | Etch,CVD | SS | Ni |
| Ozone | 03 | CVD | H | ||
| Perfluoropropane | C3F8 | CoNeaive | Etch | SS | Ni |
| Phosphine | PH3 | Reactive | CVD | SS | Ni |
| PhosphorousTrifluoride | PF3 | Implant | Ni | H | |
| Silane | SiH4 | Reactive | CVD | SS | Ni |
| SiliconTetrachloride | SiCI4 | Corrosive | Etch,CVD | Ni | H |
| SiliconTetrafluoride | SiF4 | Etch | Ni | H | |
| SulfurHexafluoride | SF6 | CoNesive | Etch | SS | Ni |
| Trichlorosilane | SiHCI3 | Corrosive | CVD | Ni | H |
| TungstenHexafluoride | WF6 | Corrosive | CVD | Ni | H |
| Xenon | Xe | Various | SS | Ni | |
We are one-stop total solution provider of UHPgas delivering components
www.asflow.com
Headquarter/R&DCenter
38, Jeongnamsandan-ro, Jeongnam-myeon, Hwaseong-si, Gyeonggi-do, Korea (18514)
TEL: 82-31-352-2301 FAX:82-31-352-2309
SalesOffice B-3321,27,Dongtancheomdansaneop 1-ro,Hwaseong-si,Gyeonggi-do,Korea (18469)
中国分公司
阿斯富乐半导体科技（苏州）有限公司
地址：上海市松江区沪亭北路199弄5号楼707室（上海办事处）
TEL: 021-6406-4116, 021-6406-4215
