做全球氟材料行业引领者FLUORINE, SILICON AND LITHIUM PRODUCTS OF DFDBE WELL-RENOWNED ALL OVER THE WORLD

氟通四海锂行天下硅达五洲硼程万里智创未来

多氟多新材料股份有限公司DO-FLUORIDE NEW MATERIALS CO..LTD.

多氟多新材料股份有限公司是致力于氟、锂、硅、硼细分领域进行材料和能源体系研究及产业化的国家高新技术企业。是全球规模领先、技术创新超前的无机氟新材料领军企业。荣获全国先进基层党组织、国家科技进步二等奖等荣誉。是国家技术创新示范企业、国家知识产权示范企业。先后承担国家“863”计划、国家战略性新兴产业、国家工业强基工程、增强制造业核心竞争力专项、国家产业基础再造工程等国家级项目30项。

公司主营业务为氟基新材料、新能源材料、电子信息材料和新能源电池，产品广泛应用于半导体集成电路、电动汽车、电解铝、核工业、医疗等领域。

公司秉承“氟通四海、锂行天下、硅达五洲、硼程万里、智创未来”的发展使命，立志做全球氟材料行业引领者，不断探求氟在人类生活和工业应用中的无限可能，为推动新能源产业绿色发展、半导体高端新材料国产化贡献智慧。

化验分析

产品介绍

电子化学品

电子级氢氟酸达到国际领先水平，电子级硝酸、电子级氨水、电子级氟化铵、电子级双氧水品质满足半导体先进制程，逐渐形成年产20万吨电子化学品生产基地。

浙江中宁硅业股份有限公司拥有国际上先进的硅烷生产工艺，国内唯一一家同时进入半导体、液晶显示屏、光伏行业的硅烷生产厂家，是国内首家高纯硅烷以及纳米硅粉的研发生产基地，拥有省级重点高纯硅材料研究院，主要产品有高纯硅烷、乙硅烷、四氟化硅、氟氮混合气、纳米硅粉等产品，先后荣获国家专精特新小巨人企业、国家高新技术企业。

多氟多同位素科技（河南）有限公司拥有国际先进、国内唯一高塔分离的硼同位素全自动化工艺生产线。主营三氟化硼、硼-10酸、碳化硼等富集硼-10系列产品；超纯三氟化硼-11、硼-11酸三乙酯等硼-11系列产品；氟化锂、四氟化硅等其他富集同位素产品。

电子化学品

槽车

多晶硅

氢氟酸/ Hydrofluoric acid

FORMULA: HF

CAS No.7664-39-3

危险标记：第8.1类，酸性腐蚀品

DIVISION OF CLASS: 8.1, corrosives presenting acidic properties

物化性质

Physical properties

分子式HF，分子量20.01，为无色透明液体，相对密度1.15\~1.18。能与一般金属、金属氧化物以及氢氧化物发生反应生成各种盐类。腐蚀性极强，能侵蚀玻璃和硅酸盐而生成气态的四氟化硅。高纯氢氟酸为强酸性清洗、腐蚀剂，可与硝酸、冰醋酸、双氧水及氢氟化铵等配制使用。

Formula is HF, and molecular weight is 20.01, it is a kind of colorless and transparent liquid, and the relative density is around 1.15–1.18. It can have a reaction with normal metal, metallic oxide and hydroxide, generating all kinds of salts. With high corrosivity, it can erode glass and silicate, generating gaseous silicon tetra fluoride. High purity hydrofluoric acid can be used as highly acid detergent and corrodent, which can also be used with nitric acid, glacial acetic acid, hydrogen peroxide and ammonium hydroxide and etc, with certain proportion.

应用范围

Application range

高纯氢氟酸广泛应用于半导体、光伏行业。在集成电路制造中，高纯氢氟酸主要用于硅片的清洗、腐蚀。特别是使用高纯氢氟酸清洗后，硅片表面能够较好地抑制自然氧化膜的生长，以利于得到质量更好的栅氧。

In the field of IC manufacture, the ultra pure HF is mainly used in the process of wafer cleaning and etching. . In particular, after DHF (Diluted HF) cleaning, the wafer surface can slow down the growth of natural oxide, so as to get better gate oxide in downstream step.

存储及包装

Storage and package

运输中严禁受损、受热和雨淋，装卸中应该轻装、轻卸，防止撞击，并且贮存于通风良好的仓库中。

In transportation, it should be carefully uploaded and discharged, no crashing, no damage, no being heated and out of the rain. It should be stored in the well ventilated warehouse.

5L HPE gallon bottle Size(H×Diam): 320×150mm Bottle neck diam: 34mm

25L HPE DrumSize(L×W×H):280×280×380mmBottle neck diam: 65mm自重量：1.2 kg-1.4kg 灌装量：25kg

200 L HPE Drum Size(H×Diam):900×590mm Bottle neck diam:750 mm

1000LIBC PP Packaging barrel Size(L×W×H):1200×1000×1160mm Bottle neck diam:150mm

30ft ISO ContainerSize(L×W×H):9125×2438×2591mmInput: DN100 valveQutput: DN80 ball valve

氢氟酸质量指标

硝酸 / Nitric acid

FORMULA: HNO₃

CAS NO.7697-37-2

危险标记：第8.1类，酸性腐蚀品

DIVISION OF CLASS: 8.1, corrosives presenting acidic properties

物化性质

Physical properties

HNO₃为无色透明液体，浓硝酸为淡黄色液体（溶有二氧化氮），正常情况下为无色透明液体。有窒息性刺激气味。浓硝酸含量为68%左右，易挥发，在空气中产生白雾，是硝酸蒸汽和水蒸汽结合而形成的硝酸小液滴。相对密度1.41，熔点-42℃（无水），沸点120.5℃（68%）。

Pure nitric acid is colorless, transparent liquid, and concentrated nitric acid is a kind of liquid with faint yellow color (containing nitrogen dioxide). When in normal condition, concentrated nitric acid is colorless and transparent liquid with suffocating pungent odor. With purity about 68%, the concentrated nitric acid is highly volatile, if exposing in the air, it will generate white smoke, which is the little liquid drop from the combination between nitric steam and water vapor. Its relative density is 1.41, melting point minus of 42℃, and the bolting point 120.5℃.

>应用范围

Application range

超纯硝酸在集成电路工艺中通常应用于以下几个方面：1、与HF混合后用于腐蚀多晶硅薄膜；2、用于清洗硅片背面的金属杂质；3、用于清洗扩散炉石英的部件等。

Ultra-purity HNO₃ is usually applied in: 1. The mixture with HF is used to etch poly-silicon film; 2. It can remove metal impurities on the backside of wafers; 3. It is used for cleaning quartz parts of the diffusion furnace and so on.

存储及包装

Storage and package

储存于阴凉、通风的库房。库温不超过30℃，相对湿度不超过80%。保持容器密封。应与还原剂、碱类、醇类、碱金属等分开存放，切忌混储。

It should be stored in shady and cool house with well ventilated condition, far away from fire and heat. The temperature is not higher than 30℃, and relative humidity is not higher than 80%, kept in sealed container. Meanwhile it should be separated from reducing agent, alkaline, alcohol, and alkalis.

5L HPE gallon bottle Size(H×Diam):320×150mm Bottle neck diam: 34mm

25L HPE DrumSize(L×W×H):280×280×380mmBottle neck diam: 65mm自重量：1.2 kg -1.4kg 灌装量：25kg

200 L HPE Drum Size(H×Diam):900×590mm Bottle neck diam:750 mm

1000LIBC PP Packaging barrel Size(L×W×H):1200×1000×1160mm Bottle neck diam:150mm

30ft ISO ContainerSize(L×W×H):9125×2438×2591mmInput: DN100 valveQutput: DN80 ball valve

硝酸质量指标

氨水 / Ammonium hydroxide

FORMULA: NH40H

CAS No. 1336-21-6

危险标记：第8.2类，碱性腐蚀品

DIVISION OF CLASS : 8.2,corrosives presenting alkalinous properties

物化性质

Physical properties

NH₄OH一般为无色透明且具有刺激性气味的液体，密度0.91g/cm³，沸点-33.34℃，极易挥发，对眼、鼻、皮肤有刺激性和腐蚀性，在空气中最大容许浓度30mg/m³。

NH4OH It is a colorless, transparent and pungent liquid with a density of 0.91g / cm³and a boiling point of-33.34°c. it is highly volatile, irritating and corrosive to eyes, nose and skin. The maximum allowable concentration of NH3H20 is 30mg / m³ in air.

>应用范围

Application range

超净高纯级氢氧化铵为碱性清洗、腐蚀剂，可与过氧化氢、水、氢氟酸配制作为SC1使用，或者直接稀释后用于PostCMP清洗，主要用于超大规模集成电路工艺技术的生产。

Ultra clean and high purity NH3H20 is a kind of alkaline cleaning and corrosive agent that can be used as SC1 with hydrogen peroxide, water, and hydrofluoric acid, or directly diluted for Post CMP cleaning, mainly used in the production of Very-large-scale integration process technology.

存储及包装

Storage and package

储存于阴凉、通风的库房。远离火种、热源。库温不宜超过30℃。保持容器密封。应与酸类、金属粉末等分开存放，切忌混储。储区应备有泄漏应急处理设备和合适的收容材料。

It should be stored in a cool, well-ventilated warehouse, away from fire and heat. The temperature should not exceed 30° C. Keep the container sealed. Be stored separately with acid, metal powder, etc. , do not mix storage. The storage area shall be provided with leak emergency handling equipment and appropriate containment materials.

5L HPE gallon bottle Size(H×Diam): 320×150mm Bottle neck diam: 34mm

25L HPE DrumSize(L×W×H):280×280×380mmBottle neck diam: 65mm自重量：1.2 kg-1.4kg 灌装量：25kg

200 L HPE Drum Size(H×Diam):900×590mm Bottle neck diam:750 mm

1000LIBC PP Packaging barrel Size(L×W×H):1200×1000×1160mm Bottle neck diam:150mm

30ft ISO ContainerSize(L×W×H):9125×2438×2591mmInput: DN100 valveQutput: DN80 ball valve

过氧化氢/Hydrogen peroxide

FORMULA H₂O2

CAS NO. 7722-84-1

危险标记：5.1类，氧化剂

DIVISION OF CLASS 5.1, OXIDIZER

物化性质：PHYSICAL PROPERTIES

物化性质

Physical properties

分子式H \mathsf { I } _ { 2 } { \mathsf { O } } _ { 2 } , 分子量34.01，为无色透明液体，相对密度1.11。与可燃性物质接触会爆炸。与碱金属、钠、钙等活泼金属接触发生反应而放出氢气。

Formula is H _ { 2 } O _ { 2 } , and molecular weight is 34.01, it is a kind of colorless and transparent liquid,and the relative density is around 1.11. It contacts with flammable substances can cause an explosion. It reacts with active metals such as alkali metals, sodium, and calcium to release hydrogen gas.

>应用范围

Application range

过氧化氢广泛应用于半导体、光伏、TFT面板行业。在集成电路制造过程中，主要用于太阳能硅片的蚀刻与清洗。能够有效去除基板表面的杂质，提高产品的质量和产量。

Hydrogen peroxide is widely used in semiconductor, photovoltaic, TFT panel industry. In the integrated circuit manufacturing process, it is mainly used for etching and cleaning solar silicon wafers. It can effectively remove the impurities on the surface of the substrate and improve the quality and yield of the product.

存储及包装

Storage and package

运输中严禁受损、受热和雨淋，装卸中应该轻装、轻卸，防止撞击，并且贮存于通风良好的仓库中。

In the transportation, it should be carefuly uploaded and discharged, no crashing, no damage, no being heated and out of the rain. It should be stored in the well ventilated warehouse.

5L HPE gallon bottle Size(H×Diam): 320×150mm Bottle neck diam: 34mm

25L HPE DrumSize(L×W×H):280×280×380mmBottle neck diam: 65mm自重量：1.2 kg-1.4kg 灌装量：25kg

200 L HPE Drum Size(H×Diam):900×590mm Bottle neck diam:750 mm

1000LIBC PP Packaging barrel Size(L×W×H):1200×1000×1160mm Bottle neck diam:150mm

30ft ISO ContainerSize(L×W×H):9125×2438×2591mmInput: DN100 valveQutput: DN80 ball valve

过氧化氢质量指标

氟化铵/Ammonium fluoride

CHEMICAL FORMULA: NH4F

CAS NO: 12125-01-8

危险标记：6.1(有毒）

DIVISION OF CLASS :6.1 (TOXIC )

物化性质

Physical properties

NHF为无色无味液体，密度为1.009g/cm³(40%浓度，20℃)，PH为6(酸性，20℃)。产品不易燃，遇酸分解,放出腐蚀性的氟化氢气体。遇碱放出有刺激性的氨。受高热分解产生有毒的腐蚀性烟气。吞咽可中毒，皮肤接触可中毒。吸入可中毒。

NH4F is aColorless and odorless liquid.Density1.009g/cm³ (40% concentration, 20°C), PH 6 (acidic, 20°C).The product is not flammable. It breaks down with acid,releasing corrosive hydrogen fluoride gas.It breaks down with alkali,releasing irritating ammonia.Toxic and corrosive smoke is produced by high thermal decomposition. Toxic if swallowed.Toxic byskin contact. Toxic by inhalation.

>应用范围

Application range

在晶圆淀积中，氟化铵用于制造工艺的降低表面张力以及促使表面更容易吸附精细晶圆的滚轮涂敷程序中。

In wafer deposition, NHF is used in the roller coating program to reduce surface tension in manufacturing processes and facilitate easier surface adsorption of fine wafers.

存储及包装

Storage and package

存放在阴凉、通风、干燥处，保持容器密闭。远离热源、热表面、火花、明火和其他点火源。200升桶装或者罐式集装箱。仓库应配备合适的意外泄露收集设备及消防设备。

Store in a cool, ventilated, dry place and keep the container airtight. Keep away from heat sources, hot surfaces, sparks, open flames, and other sources of ignition.200L drum and tank.The storeroom should be equipped with proper facilities for accidental leakage and fire.

氟化铵质量指标

甲硅烷/Silane

CHEMICAL FORMULA: SIH₄

CAS No. 7803-62-5

危险标记：第2.1类，易燃气体

DIVISION OF CLASS : 2.1, flammable gas

物化性质

Physical properties

分子式SiH₄，分子量32.12，为无色透明气体，密度1.44g/L(0℃，1bar)，与空气混合能形成爆炸性混合物。遇明火、高热极易燃烧爆炸。暴露在空气中能自燃。与氟、氯等接触会发生剧烈的化学反应。

Formula is SiH4, and molecular weight of 32.12, is a colorless transparent gas with a density of 1.44g/L (0 C, 1bar), which can form an explosive mixture with air mixture. It is easy to burn and explode in a clear fire and high heat. Exposure to air can be self igniting. Intense chemical reactions occur in contact with fluorine and chlorine.

>应用范围

Application range

硅烷作为一种提供硅组分的气体源，广泛应用于微电子、光电子工业，用于制造太阳电池、平板显示器、玻璃和钢铁镀层。

Silane as a gas source that provides silicon components, is widely used in microelectronics and optoelectronics industry. It is used to make solar cells, flat panel displays, glass and iron and steel coatings.

存储及包装

Storage and package

运送过程中，钢瓶和容器必须接地和跨接，防止产生静电。搬运时轻装轻卸，防止钢瓶及附件破损。储存于阴凉、干燥、通风良好的库房。远离火种、热源。钢瓶温度不超过52℃。保持容器密封。

In the course of delivery, the cylinders and containers must be grounded and straddled to prevent the generation of static electricity. Light and light unloading when handling, prevent steel bottles and accessories from breakage. Store in a cool, dry, well ventilated storeroom. Stay away from fire and heat. The temperature of the cylinder is not more than 52 degrees C. Keep the container seal.

甲硅烷质量指标

氟氮混合气/Fluorine-nitrogen mixture

CHEMICAL FORMULA: 20%F2/N{2 CAS NO:7782-41-4

危险标记：2.3类（有毒气体）

DIVISION OF CLASS :2.3 (TOXIC GASES)

物化性质

Physical properties

氟氮混合气是一种极活泼，具有很强的吸水性、强腐蚀性的气体，能与碱、金属、氧化物以及硅酸盐（能腐蚀玻璃和破坏其他含硅物质，）等反应，在一定条件下能与水自由混合成氢氟酸（溶于水时激烈放热而成氢氟酸）。

20%F2/N2is an extremely active, highly absorbent, and corrosive gas that can react with alkalis, metals, oxides, and silicates (which can corrode glass and destroy other siliceous substances). Under certain conditions, it can freely mix with water to form hydrofluoric acid (which is formed by intense heat release when dissolved in water).

应用范围

Application range

氟气是精细化工领域的重要原料，广泛应用于电子、激光技术、医药塑料等领域。由于它的强氧化性，可以用于玻璃浸蚀、金属材料、管道的表面钝化处理，在国防上用于制取火箭推进剂。氟气还用于电子、医药、卫生、科研等领域。

Fluorine gas is an important raw material in the field of fine chemicals, widely used in fields such as electronics, laser technology, pharmaceutical plastics, etc. Due to its strong oxidizing properties, it can be used for surface passivation treatment of glass etching, metal materials, and pipelines, and in the production of rocket propellants in national defense. Fluorine gas is also used in fields such as electronics, medicine, health, and scientific research.

存储及包装

Storage and package

储存于阴凉、通风仓间内。仓内温度不宜超过40℃。远离火种热源。防止阳光直射。应与易燃物、金属粉末、氧等氧化剂严格分开存放。验收时要注意品名，注意验瓶日期，先进仓的先发用。搬运时轻装轻卸，防止钢瓶及附件破损。不得分装。钢瓶阀门操作必须使用标准的手轮。

Store in a cool and ventilated warehouse. The temperature inside the warehouse should not exceed 40℃. Keep away from ignition and heat sources. Prevent direct sunlight. It should be strictly stored separately from inflammable, metal powders, oxygen and other oxidizing agents. During acceptance, attention should be paid to the product name, bottle inspection date, and the ones in the first warehouse should be used first. During transportation, load and unload with care to prevent damage to steel cylinders and accessories. Do not pack separately. Standard handwheels must be used for cylinder valve operation.

20%F₂/N₂(氟氮混气)

四氟化硅/Silicon tetrafluoride

CHEMICAL FORMULA: SiFCAS NO: 7783-61-1

危险标记：6（有毒气体），20（腐蚀品）

DIVISION OF CLASS :6 (POISONOUS GAS), 20 (CORROSIVE SUBSTANCE)

物化性质

Physical properties

分子式SiF₄，分子量104.06，为无色刺激性气体，密度4.67g/L(0℃，1bar)，易潮解。在潮湿的空气中生成氟化氢浓烟雾。

Molecular formula SiF, molecular weight 104.06, it is a colorless pungent gas, the density is 4.67g/L(0, 1bar), easy to deliquesce, and it will be to generate hydrogen fluoride smoke in humid air .

>应用范围

Application range

四氟化硅作为一种提供氟硅组分的气体源，广泛应用于氟硅酸、氟化铅的制取，也用作水泥和人造大理石的硬化剂及有机硅化合物的合成材料。

Silicon tetrafluoride is widely used in the preparation of fluorosilicic acid and lead fluoride. It is also used as a hardener for cement and artificial marble and as a synthetic material for organosilicon compounds.

存储及包装

Storage and package

运送过程中，钢瓶和容器必须接地和跨接，防止产生静电。搬运时轻装轻卸，防止钢瓶及附件破损。储存于阴凉、干燥、通风良好的库房。远离火种、热源。应与酸类、食用化学品分开存放。钢瓶温度不超过52℃。保持容器密封。

Cylinders and containers must be grounded and bridged during shipment to prevent static electricity. Lightly load and unload during handling to prevent damage to cylinders and accessories. Store in a cool, dry, well-ventilated warehouse. Keep away from fire and heat. It should be stored separately from acids and food chemicals. The temperature of the cylinder does not exceed 52°C. Keep the container sealed.

SIF4 Package

乙硅烷/ Disilane

CHEMICAL FORMULA:Si{2H\_

CAS NO: 1590-87-0

危险标记：2.1(易燃气体)

DIVISION OF CLASS :2.1 (FLAMMABLE GAS)

物化性质

Physical properties

乙硅烷是一种无机化合物，其化学式为Si,H₆，在常温常压下为无色透明具有不愉快刺激臭的有毒气体，在自身蒸汽压下是无色透明液体。乙硅烷气体可以与氢气、氩气、氮气、氦气等以任意比例混合可溶于二硫化碳、乙基醇、苯和乙基硅酸。

Si2H6is a inorganic compound with the chemical formula of Si2H. It is a colorless transparent toxic gas with unpleasant odor under normal temperature and pressure, and a colorless transparent liquid under its own vapor pressure. Ethylsilane gas can be mixed with hydrogen, argon, nitrogen, helium, and other gases in any ratio and is soluble in carbon disulfide, ethyl alcohol, benzene, and ethyl silicic acid.

>应用范围

Application range

在半导体工艺中用于外延和扩散工艺,也可应用于非晶硅膜、外延成长、氧化膜、氮化膜、化学气相淀积等方面。

Used in semiconductor processes for epitaxial and diffusion processes, as well as in amorphous silicon films, epitaxial growth, oxide films, nitride films, chemical vapor deposition, and other fields

存储及包装

Storage and package

运送过程中，钢瓶和容器必须接地和跨接，防止产生静电。搬运时轻装轻卸，防止钢瓶及附件破损。储存于阴凉、干燥、通风良好的库房。远离火种、热源。钢瓶温度不超过52℃。保持容器密封，乙硅烷比硅烷更不稳定，所以，钢瓶温度不能冷却到乙硅烷的沸点(-14.3℃)以下。

During transportation, steel cylinders and containers must be grounded and cross connected to prevent the generation of static electricity. During transportation, load and unload with care to prevent damage to steel cylinders and accessories. Store in a cool, dry, and well ventilated warehouse. Keep away from sparks and heat sources. The temperature of the steel cylinder shall not exceed 52 C. Keep the container sealed. Ethylene silane is more unstable than silane, so the cylinder temperature cannot be cooled below the boiling point of ethylene silane (-14.3 C).

乙硅烷质量指标

一氯硅烷/Monochlorosilane

CHEMICAL FORMULA:SiH2CL

CAS NO:13456-71-9

危险标记：2. 1(易燃气体)

DIVISION OF CLASS:2.1 (FLAMMABLE GAS)

物化性质

Physical properties

分子式：SiH₃Cl，分子量：66.56，气体密度约1.18kg/m³。无色易燃气体，有刺激性，遇水剧烈反应，极易燃、剧毒、强腐蚀性。

Molecular formula: SiH₃Cl, Molecular weight: 66.56, Density: 1.18 kg/m³. Colorless flammable gas with pungent odor, reacts violently with water, extremely flammable, toxic and corrosive

>应用范围

Application range

用于半导体外延生长、硅化物沉积、浅结掺杂，可作为硅源气体，应用于先进芯片的薄膜沉积与半导体器件制造。

Used for semiconductor epitaxial growth, silicide deposition, and shallow junction doping. As a silicon source gas, it is applied in thinfilm deposition and advanced semiconductor device manufacturing.

存储及包装

Storage and package

运送应储存在阴凉、干燥、通风良好的专用库房，远离火源、热源及氧化剂，严禁受潮。采用耐压钢瓶密封包装，避免碰撞、暴晒，钢瓶需直立固定并接地。严禁与水、酸、碱、氧化剂混储混运，库温不宜过高，配备防爆消防设施，操作人员需专业防护。

二氯硅烷/ Dichlorosilane

CHEMICAL FORMULA:SiH₂Cl2

CAS NO:4109-96-0

危险标记：2. 1(易燃气体)

DIVISION OF CLASS:2.1 (FLAMMABLE GAS)

物化性质

Physical properties

分子式： S i H _ { 2 } C l _ { 2 } 分子量：101.01，气体密度约3.69 kg/m³。无色易燃气体，遇水剧烈反应放热，剧毒、强腐蚀性。

Molecular formula: SiH2Cl2, Molecular weight: 101.01, Density: 3.69 kg/m³. Colorless flammable gas, reacts violently with water to release heat and corrosive acid mist, highly toxic and corrosive.

>应用范围

Application range

作为硅源广泛用于硅外延、氧化硅、氮化硅薄膜制备，是集成电路、功率器件、晶圆制造中的关键电子特气。

Widely used as a silicon source for silicon epitaxy, SiO₂ and Si₃N4 thin-film preparation. It is a critical electronic gas for integrated circuits, power devices, and wafer fabrication

存储及包装

Storage and package

储存于阴凉、干燥、防爆通风处，严禁进水、受潮。包装为高压专用气瓶，密封可靠，防止泄漏。远离火种、热源、氧化剂及腐蚀性物质，库温严格控制。气瓶直立固定，严禁滚动、撞击。分区存放，严禁与食品、饲料混储，配备泄漏应急处理设备。

三氯硅烷/Trichlorosilane

CHEMICAL FORMULA:SiH3CL

CAS NO:77-90-7

危险标记：3(易燃液体)

DIVISION OF CLASS:2.1 (FLAMMABLE GAS)

物化性质

Physical properties

分子式：SiHCl₃，分子量：135.45，液体密度1.34g/cm³。无色易挥发液体，遇水剧烈水解，放出易燃气体，高度易燃、有毒、强腐蚀。

Molecular formula: SiHCl₃, Molecular weight: 135.45, Density: 1.34g/cm³. Colorless volatile liquid, hydrolyzes violently with water to release flammable gas, highly flammable, toxic and corrosive

>应用范围

Application range

主要用于生产高纯多晶硅、单晶硅，也用于外延、化学气相沉积（CVD），是半导体硅片与光伏产业核心原料。

Mainly used to produce high-purity polycrystalline and monocrystalline silicon. Also applied in epitaxy and CVD; it is a core raw material for semiconductor wafers and PV industry.

存储及包装

Storage and package

储存于阴凉、干燥、通风的耐腐蚀库房，远离火源、热源、氧化剂及水。采用防爆、耐腐蚀密封容器或钢瓶包装，避光、避热，防止静电与碰撞。严禁与水接触，地面做防腐蚀处理，配备泄漏吸收、防爆及消防器材，实行专人管理。

三甲基硅烷/Trimethylsilane

CHEMICAL FORMUL \mathsf { A } : \mathsf { C } _ { 3 } \mathsf { H } _ { 1 0 } \mathsf { S i }

CAS NO:75-76-3

危险标记：2.1(易燃气体)

DIVISION OF CLASS:2.1 (FLAMMABLE GAS)

物化性质

Physical properties

分子式： { \sf C } _ { 3 } { \sf H } _ { 1 0 } { \sf S } { \sf i } ，分子量：74.20，气体密度约0.0047g/cm³（0℃，1 atm）。无色易燃气体，有特殊气味，遇水缓慢反应，极易燃，具刺激性与窒息性。

Molecular formula: { \sf C } _ { 3 } { \sf H } _ { 1 0 } { \sf S } { { i } } , Molecular weight: 74.20, Density: 0.0047g/cm³(0, 1 atm).Colorless flammable gas with characteristic odor, reacts slowly with water, extremely flammable, irritating and asphyxiant.

>应用范围

Application range

用作半导体沉积硅源，用于低介电常数薄膜、氮化硅、氧化硅及钝化层制备，广泛应用于集成电路、先进封装与半导体器件制造。

Used as silicon source for semiconductor deposition, for preparing low-k films, SiN, SiO₂ and passivation layers. Widely applied in integrated circuits, advanced packaging and semiconductor device manufacturing.

存储及包装

Storage and package

运送储存在阴凉、通风、防火防爆专用仓库，远离热源、火花、静电及氧化剂。以耐压气瓶密封包装，直立固定，防止倾倒、撞击与暴晒。严禁与水、空气长时间接触，库温控制在安全范围，配备防爆通风与消防装置，严禁无关人员进入。

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三甲基硅烷质量指标

甲基硅烷/ Methylsilane

CHEMICAL FORMULA:SiH3CL

CAS NO:992-94-9

危险标记：2. 1(易燃气体)

DIVISION OF CLASS:2.1 (FLAMMABLE GAS)

物化性质

Physical properties

分子式：CH₆Si，分子量：46.16，气体密度：1.65kg/m³（25℃，1atm）。无色易燃气体，无臭，极易燃，可与空气形成爆炸性混合物，遇水缓慢反应，化学性质活泼。

Molecular formula: CH6Si, Molecular weight: 46.16, Gas density: 1.65 kg/m³ (25 ,1atm).Colorless flammable gas, odorless, extremely flammable, forms explosive mixtures with air, reacts slowly with water, chemically reactive.

>应用范围

Application range

作为高纯硅源、碳源气体，用于碳化硅半导体CVD沉积、碳化硅外延生长、低介电常数薄膜与钝化层制备，应用于先进集成电路、功率器件及晶圆制造工艺。

As a high-purity silicon and carbon source gas, it is used for CVD deposition, epitaxial growth and silicon carbide coating of silicon carbide (SiC) semiconductors, as well as the preparation of low-k dielectric films and passivation layers. It is applied in advanced integrated circuits, power devices and wafer manufacturing processes.

存储及包装

Storage and package

应储存在阴凉、干燥、通风良好的防爆专用库房，远离火源、热源、静电及强氧化剂，库温控制在安全范围。采用高压无缝钢瓶密封包装，钢瓶直立固定，防止倾倒、碰撞与暴晒，做好接地防静电。严禁与水、酸、碱、氧化剂混储，配备泄漏应急及防爆消防设施。

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